Poonawala, Amyn : rechercher sur Z-Library

Le plus grand référentiel d'articles scientifiques au monde. 70,000,000+ d'articles gratuitement.

Don't use scam websites

Livres
Articles (13)
Les plus populaires
Liste
- Liste
- Tableau

1

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Optical Microlithography XIX - OPC and PSM design using inverse lithography: a nonlinear optimization approach

Poonawala, Amyn, Milanfar, Peyman, Flagello, Donis G.

Année:

2006

Langue:

english

Fichier:

PDF, 374 KB

english, 2006

2

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - ILT for double exposure lithography with conventional and novel materials

Poonawala, Amyn, Borodovsky, Yan, Milanfar, Peyman, Flagello, Donis G.

Année:

2007

Langue:

english

Fichier:

PDF, 674 KB

english, 2007

3

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - Source mask optimization for advanced lithography nodes

Poonawala, Amyn, Dusa, Mircea V., Conley, Will, Stanton, William, Sawh, Chander

Année:

2010

Langue:

english

Fichier:

PDF, 779 KB

english, 2010

4

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Optical Microlithography XXX - Addressing optical proximity correction challenges from highly nonlinear models

Erdmann, Andreas, Kye, Jongwook, Jang, Stephen, Zhang, Yunqiang, Cecil, Tom, Cai, Howard, Poonawala, Amyn, St. John, Matt

Année:

2017

Langue:

english

Fichier:

PDF, 437 KB

english, 2017

5

A pixel-based regularization approach to inverse lithography

Amyn Poonawala, Peyman Milanfar

Journal:

Microelectronic Engineering

Année:

2007

Langue:

english

Fichier:

PDF, 1.51 MB

english, 2007

6

Shape Estimation from Support and Diameter Functions

Amyn Poonawala, Peyman Milanfar, Richard J. Gardner

Journal:

Journal of Mathematical Imaging and Vision

Année:

2006

Langue:

english

Fichier:

PDF, 1.86 MB

english, 2006

7

SPIE Proceedings [SPIE Electronic Imaging 2005 - San Jose, CA (Monday 17 January 2005)] Computational Imaging III - Prewarping techniques in imaging: applications in nanotechnology and biotechnology

Poonawala, Amyn, Milanfar, Peyman, Bouman, Charles A., Miller, Eric L.

Année:

2005

Langue:

english

Fichier:

PDF, 260 KB

english, 2005

8

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - Model-based assist feature placement: an inverse imaging approach

Poonawala, Amyn, Kawahira, Hiroichi, Zurbrick, Larry S., Painter, Benjamin, Mayhew, Jeffrey

Année:

2008

Langue:

english

Fichier:

PDF, 1.32 MB

english, 2008

9

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Model-based assist feature placement for 32nm and 22nm technology nodes using inverse mask technology

Poonawala, Amyn, Zurbrick, Larry S., Montgomery, M. Warren, Painter, Benjamin, Kerchner, Chip

Année:

2009

Langue:

english

Fichier:

PDF, 7.06 MB

english, 2009

10

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - Suppressing ringing effects from very strong off-axis illumination with novel OPC approaches for low k1 lithography

Cork, Chris, Dusa, Mircea V., Conley, Will, Amoroso, Frank, Poonawala, Amyn, Jang, Stephen, Lucas, Kevin

Année:

2010

Langue:

english

Fichier:

PDF, 8.40 MB

english, 2010

11

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - Process window and integration results for full-chip model-based assist-feature placement at the 32 nm node and below

Li, Ji, Dusa, Mircea V., Conley, Will, Luk-Pat, Gerard, Poonawala, Amyn, Lucas, Kevin, Painter, Ben

Année:

2010

Langue:

english

Fichier:

PDF, 2.05 MB

english, 2010

12

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Simultaneous source-mask optimization: a numerical combining method

Mülders, Thomas, Montgomery, M. Warren, Maurer, Wilhelm, Domnenko, Vitaliy, Küchler, Bernd, Klimpel, Thomas, Stock, Hans-Jürgen, Poonawala, Amyn A., Taravade, Kunal N., Stanton, William A.

Année:

2010

Langue:

english

Fichier:

PDF, 2.23 MB

english, 2010

13

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - Integrating assist feature print fixing with OPC

Barnes, Levi D., Levinson, Harry J., Dusa, Mircea V., Poonawala, Amyn, Painter, Benjamin D., Jost, Andrew M., Takei, TJ, Li, Yong

Année:

2009

Langue:

english

Fichier:

PDF, 1.76 MB

english, 2009